695106
p-Phenylenediamine
sublimed, ≥99%
Synonym(s):
1,4-Benzenediamine, 1,4-Diaminobenzene, 1,4-Phenylenediamine
Select a Size
About This Item
vapor density
3.7 (vs air)
Quality Level
vapor pressure
1.08 mmHg ( 100 °C)
description
anti-fade reagent
assay
≥99%
form
sublimed
bp
267 °C (lit.)
mp
138-143 °C (lit.)
SMILES string
Nc1ccc(N)cc1
InChI
1S/C6H8N2/c7-5-1-2-6(8)4-3-5/h1-4H,7-8H2
InChI key
CBCKQZAAMUWICA-UHFFFAOYSA-N
Still not finding the right product?
Explore all of our products under p-Phenylenediamine
signalword
Danger
Hazard Classifications
Acute Tox. 3 Dermal - Acute Tox. 3 Inhalation - Acute Tox. 3 Oral - Aquatic Acute 1 - Aquatic Chronic 1 - Eye Irrit. 2 - Skin Sens. 1 - STOT SE 1 Oral
target_organs
Kidney,Heart,Musculo-skeletal system
Storage Class
6.1C - Combustible acute toxic Cat.3 / toxic compounds or compounds which causing chronic effects
wgk
WGK 3
flash_point_f
230.0 °F - closed cup
flash_point_c
110 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type P2 (EN 143) respirator cartridges
Regulatory Information
This item has
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Articles
近十年来出现了原子层沉积（ALD）技术以满足各种需求，包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.