Quality Level
form
liquid
refractive index
n20/D 1.498 (lit.)
bp
117 °C (lit.)
mp
−28 °C (lit.)
density
1.205 g/mL at 25 °C (lit.)
SMILES string
CC[Zn]CC
InChI
1S/2C2H5.Zn/c2*1-2;/h2*1H2,2H3;
InChI key
HQWPLXHWEZZGKY-UHFFFAOYSA-N
General description
Application
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Danger
hcodes
supp_hazards
存储类别
4.2 - Pyrophoric and self-heating hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Eye Dam. 1 - Pyr. Liq. 1 - Skin Corr. 1B - Water-react. 1
法规信息
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商品
近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
Nanomaterials are considered a route to the innovations required for large-scale implementation of renewable energy technologies in society to make our life sustainable.
Atomic Layer Deposition (ALD) technology ensures uniform coating on complex 3D surfaces with precise chemisorption cycles.


