679232
三甲氧基甲基硅烷
deposition grade, ≥98%
别名:
甲基三甲氧基硅烷
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线性分子式:
CH3Si(OCH3)3
化学文摘社编号:
分子量:
136.22
UNSPSC Code:
12352103
NACRES:
NA.23
PubChem Substance ID:
EC Number:
214-685-0
Beilstein/REAXYS Number:
1736151
MDL number:
grade
deposition grade
assay
≥98%
form
liquid
refractive index
n20/D 1.371 (lit.)
bp
102-104 °C (lit.)
density
0.955 g/mL at 25 °C (lit.)
SMILES string
CO[Si](C)(OC)OC
InChI
1S/C4H12O3Si/c1-5-8(4,6-2)7-3/h1-4H3
InChI key
BFXIKLCIZHOAAZ-UHFFFAOYSA-N
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signalword
Danger
hcodes
Hazard Classifications
Flam. Liq. 2
存储类别
3 - Flammable liquids
wgk
WGK 3
flash_point_f
48.2 °F
flash_point_c
9 °C
ppe
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
法规信息
危险化学品
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商品
涉及到反应性有机硅化学的研究已聚焦于纯硅和杂合材料的生产、氢化硅烷化、开环和原子转移聚合，以及具有受控立体化学的聚合和缩合反应。
atomic layer deposition (ALD), microelectronics, Mo:Al2O3 films, nanocomposite coating, photovoltaics, semiconductor devices, W:Al2O3 films, composite films, layer-by-layer
Silica's versatility spans various industries, including biomedical applications.