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205389

Sigma-Aldrich

Hexamethyldisiloxane

≥98%

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Synonym(s):
HMDSO
Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
107-46-0
Molecular Weight:
162.38
Beilstein:
1736258
EC Number:
203-492-7
MDL number:
MFCD00008265
PubChem Substance ID:
24852329
NACRES:
NA.22

vapor density

>1 (vs air)

Quality Level

200

Assay

≥98%

form

liquid

refractive index

n20/D 1.377 (lit.)

bp

101 °C (lit.)
101 °C

mp

−59 °C (lit.)

density

0.764 g/mL at 20 °C (lit.)

SMILES string

C[Si](C)(C)O[Si](C)(C)C

InChI

1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3

InChI key

UQEAIHBTYFGYIE-UHFFFAOYSA-N

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General description

Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.

Application

Hexamethyldisiloxane can be used:
  • To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.
  • To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively.

Pictograms

FlameEnvironment
GHS02,GHS09

Signal Word

Danger

Hazard Statements

H225 - H410

Precautionary Statements

P210 - P273

Hazard Classifications

Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2

Storage Class Code

3 - Flammable liquids

WGK

WGK 2

Flash Point(F)

21.2 °F - closed cup

Flash Point(C)

-6 °C - closed cup

Personal Protective Equipment

dust mask type N95 (US), Eyeshields, Gloves

Regulatory Information

危险化学品

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Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
Schmidt-Szalowski K, et al.
Plasmas and polymers, 5(3-4), 173-190 (2000)
Israel Sifuentes-Nieves et al.
International journal of biological macromolecules, 144, 682-689 (2019-12-21)
In the present study, the effect of plasma treatment on the structural properties of three granular corn starches (normal, Hylon V and Hylon VII) was investigated. Thermal (TGA/DSC), structural (XRD/FTIR) and chemical (XPS) properties were evaluated. Plasma treatment resulted in
The Raman Spectra of Hexamethyldisilane and Hexamethyldisiloxane.
Murata H and Kumada M.
J. Chem. Phys., 21(5), 945-945 (1953)
Ion chemistries in hexamethyldisiloxane.
Jiao CQ, et al.
Journal of Vacuum Science & Technology. A, Vacuum, Surfaces, And Films, 23(5), 1295-1304 (2005)
Thomas J Curphey
The Journal of organic chemistry, 67(18), 6461-6473 (2002-08-31)
The combination of P4S10 and hexamethyldisiloxane efficiently converts esters, lactones, amides, lactams, and ketones to their corresponding thiono derivatives. In the presence of elemental sulfur, 3-oxoesters are converted to dithiolethiones by this reagent. Yields are comparable to or superior to
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